Measurement of molecular order and orientation in nanoscale organic films

Title: Measurement of molecular order and orientation in nanoscale organic films
Creator: Watts, Benjamin; Thomsen, Lars; Dastoor, Paul C.
Relation: Synthetic Metals Vol. 152, no. 1-3, p. 21-24
Publisher: Elsevier
Resource Type: journal article
Date: 2005
Description: Self-assembled monolayers (SAMs) have, in recent years, attracted much interest for surface modification, surface coatings and as interfacial coupling agents. X-ray photoelectron spectroscopy (XPS) and carbon K-edge near edge X-ray absorption fine structure (NEXAFS) have been used to non-destructively measure the molecular conformation of organic films with thickness of the order of 1nm. Three different types of molecular conformation were found for γ-aminopropyltriethoxysilane (γ-APS) films formed on ZnO surfaces. The orientation of γ-APS films was observed to vary with adsorption time and surface coverage. Thus the molecular conformation of thin films can be controlled through adjustment of the application parameters.
Identifier: uon:611
Identifier: http://hdl.handle.net/1959.13/24688
Identifier: ISSN:0379-6779
Language: eng
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